1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

1983年8月30日〜9月1日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

1983年8月30日〜9月1日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-1-3]Ultra-Smooth Heteroepitaxial NiSi2, Films on Silicon Grown by Molecular Beam Epitaxy

A. Ishizaka、Y. Shiraki、K. Nakagawa、E. Maruyama(1.Central Research Laboratory, Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.1983.A-1-3
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