1983 Conference on Solid State Devices and Materials
1983年8月30日〜9月1日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-2-3]Formation of Si Epi./MgO・Al2O3 Epi./SiO2/Si and Its Epitaxial Film Quality
Masao Mikami、Yasuaki Hokari、Koji Egami、Hideki Tsuya、Masaru Kanamori(1.Fundamental Research Laboratories and Microelectronics Laboratories, NEC Corporation)