1990 International Conference on Solid State Devices and Materials

1990 International Conference on Solid State Devices and Materials

1990年8月22日〜8月24日Hotel Sendai Plaza, Sendai, Japan
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International Conference on Solid State Devices and Materials
1990 International Conference on Solid State Devices and Materials

1990 International Conference on Solid State Devices and Materials

1990年8月22日〜8月24日Hotel Sendai Plaza, Sendai, Japan

[C-2-7]Low Temperature Deposition of High Quality Silicon Oxide Films

Hideo IZAWA、Yutaka NISHI、Masaya OKAMOTO、Hiroshi MORIMOTO、Mitsuo ISHII(1.Giant Electronics Technology Co.、2.Liquid Crystal Laboratories and Liquid Crystal Display Group, Sharp Co.)
https://doi.org/10.7567/SSDM.1990.C-2-7
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