1993 International Conference on Solid State Devices and Materials
1993年8月29日〜9月1日Makuhari Messe, Chiba, Japan
1993 International Conference on Solid State Devices and Materials
1993年8月29日〜9月1日Makuhari Messe, Chiba, Japan
[S-III-3]Layer-by-Layer Etching of Si by Self-Limited Adsorption of Chlorine with Alternated Irradiation of Low Energy Ar+ Ions
Takashi MATSUURA、Junichi MUROTA、Yasuji SAWADA、Tadahiro OHMI(1.Laboratory for Microelectronics, Research Institute of Electrical Communication, Department of Electronic Engineering, Faculty of Engineering, Tohoku University)
