2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
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International Conference on Solid State Devices and Materials
2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[A-1-2]Influences of Gate-Poly Impurity Concentration on Inversion-Layer Mobility in MOSFETs with Ultrathin Gate Oxide Film

Junji Koga、Takamitsu Ishihara、Shin-ichi Takagi(1.Advanced LSI Technology Laboratory, Toshiba Corporation)
https://doi.org/10.7567/SSDM.2003.A-1-2
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