2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
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International Conference on Solid State Devices and Materials
2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[A-1-5]Direct evaluation of an interfacial layer in high-k gate dielectrics by 1/f noise measurements

Tsuyoshi Ishikawa、Shinpei Tsujikawa、Shin-ichi Saito、Digh Hisamoto、Shin’ichiro Kimura(1.Central Research Laboratory, Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.2003.A-1-5
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