2003 International Conference on Solid State Devices and Materials
2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
2003 International Conference on Solid State Devices and Materials
2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
[A-2-6]Gate Engineering to prevent NMOS Dopant Channeling for Nano-Scale CMOSFET Technology
S.H. Park、H.D. Lee、J.S. Kim、S.H Baek、H. Chang、J.H. Lee、K.C. Kim、B.S. Song、H.K. Bae、M.O. Kim、H.S. Lee、Y.S. Kang、D.B. Kim(1.System IC R&D Division, Hynix Semiconductor Inc.、2.Dept. of Electronics Engineering, Chungnam National University)
