2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
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International Conference on Solid State Devices and Materials
2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[A-3-1]Integration Issues of HfO2-Al2O3 Laminate for Gate and Capacitor Dielectric

Jong-Ho Lee(1.Advanced Process Development Team, System LSI Division, Samsung Electronics Co., Ltd.)
https://doi.org/10.7567/SSDM.2003.A-3-1
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