[A-9-2]Channel direction impact of (110) surface Si substrate on performance improvement in sub-100 nm MOSFETs
Hidetatsu Nakamura、Tatsuya Ezaki、Toshiyuki Iwamoto、Mitsuhiro Togo、Nobuyuki Ikarashi、Masami Hane、Toyoji Yamamoto(1.Silicon Systems Research Labs., NEC Corporation)
