2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
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International Conference on Solid State Devices and Materials
2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜9月18日Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[A-9-3]Characterization of Plasma Nitridation Impact on Lateral Extension Profile in 50nm N-MOSFET by Scanning Tunneling Microscopy

Hidenobu Fukutome、Takashi Saiki、Mitsuaki Hori、Takuji Tanaka、Ryou Nakamura、Hiroshi Arimoto(1.FUJITSU LABORATORIES LTD., Silicon technologies laboratories, Advanced CMOS technology lab.、2.FUJITSU LTD., Advanced LSI development div.)
https://doi.org/10.7567/SSDM.2003.A-9-3
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