2006 International Conference on Solid State Devices and Materials

2006 International Conference on Solid State Devices and Materials

2006年9月12日〜9月15日PACIFICO Yokohama, Yokohama, Japan
戻る
International Conference on Solid State Devices and Materials
2006 International Conference on Solid State Devices and Materials

2006 International Conference on Solid State Devices and Materials

2006年9月12日〜9月15日PACIFICO Yokohama, Yokohama, Japan

[A-3-3]Ultra high aspect ratio sub-micron silicon micromachining by double-passivation deep reactive ion etching

Ranganathan Nagarajan、B. Ramana Murthy(1.Institute of Microelectronics, Semiconductor Process Technology Laboratory)
https://doi.org/10.7567/SSDM.2006.A-3-3
PDFダウンロードPDFダウンロード
戻る