2007 International Conference on Solid State Devices and Materials
2007年9月18日〜9月21日Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
2007 International Conference on Solid State Devices and Materials
2007年9月18日〜9月21日Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
[A-1-2]PMOSFET Vth Modulation Technique using Fluorine Treatment through ALD-TiN Suitable for CMOS Devices
K. Tai、S. Yamaguchi、K. Tanaka、T. Hirano、I. Oshiyama、S. Kazi、T. Ando、M. Nakata、M. Yamanaka、R. Yamamoto、S. Kanda、Y. Tateshita、H. Wakabayashi、Y. Tagawa、M. Tsukamoto、H. Iwamoto、M. Saito、N. Nagashima、S. Kadomura(1.Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation)
