[A-6-3]A Comparative Study of Plasma Source-Dependent Charging Polarity in MOSFETs with High-k and SiO2 Gate Dielectrics
Koji Eriguchi、Masayuki Kamei、Daisuke Hamada、Kenji Okada、Kouichi Ono(1.Graduate School of Engineering, Kyoto University、2.MIRAI-AIST)
