2007 International Conference on Solid State Devices and Materials
2007年9月18日〜9月21日Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
2007 International Conference on Solid State Devices and Materials
2007年9月18日〜9月21日Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
[A-8-3]Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process
X.P. Wang、M.-F. Li、H.Y. Yu、J.J. Yang、C.X. Zhu、W.S. Hwang、W.Y. Loh、A.Y. Du、J.D. Chen、Albert Chin、S. Biesemans、G.Q. Lo、D.-L. Kwong(1.SNDL, ECE Dept, National University of Singapore、2.Institute of Microelectronics, Singapore、3.IMEC、4.Dept. of Microelectronics, Fudan University、5.Dept. of Electronics Eng., Nat’l Chiao-Tung Univ.)
