[A-9-2]Effectiveness of Aluminum Incorporation in Nickel Silicide and Nickel Germanide Metal Gates for Work Function Reduction
Andy E.-J. Lim、Rinus T.P. Lee、Alvin T.Y. Koh、Ganesh S. Samudra、Dim-Lee Kwong、Yee-Chia Yeo(1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore)
