[B-3-3]In-Depth Study of Two-Dimensional Layout Dependences in Multiple-Stressor CMOS for 45 nm Technology Node High-Performance Applications
T. Miyashita、J. Ogura、T. Owada、T. Sakuma、H. Nomura、H. Miyaoka、A. Hasegawa、S. Yamaguchi、S. Satoh(1.Fujitsu Laboratories Ltd.、2.Fujitsu Limited)
