[A-2-2]Low-loss Si waveguides with Variable-Shaped-Beam EB Lithography for Large-scaled Photonic Circuits
N. Hirayama1,2、H. Takahashi1,3、Y. Noguchi1,2、M. Yamagishi1,2、T. Horikawa1,2(1.Inst. for Photonics-Electronics Convergence System Tech.、2.National Inst.of Advanced Industrial Science and Tech.、3.Photonics Electronics Tech. Res. Association , Japan)
