2012 International Conference on Solid State Devices and Materials

2012 International Conference on Solid State Devices and Materials

2012年9月25日〜9月27日Kyoto International Conference Center, Kyoto, Japan
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International Conference on Solid State Devices and Materials
2012 International Conference on Solid State Devices and Materials

2012 International Conference on Solid State Devices and Materials

2012年9月25日〜9月27日Kyoto International Conference Center, Kyoto, Japan

[A-2-6]Fabrication of Er silicate crystalline waveguide by directed self-assembly approach using radical assisted sputtering

T. Nakajima1、T. Shinagawa1、T. Kimura1、H. Isshiki1、T. Sugawara2、Y. Jiang2(1.Univ. of Electro-Communications、2.Shincron Co. Ltd. , Japan)
https://doi.org/10.7567/SSDM.2012.A-2-6
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