2016 International Conference on Solid State Devices and Materials
2016年9月26日〜9月29日Tsukuba International Congress Center, Tsukuba, Japan
2016 International Conference on Solid State Devices and Materials
2016年9月26日〜9月29日Tsukuba International Congress Center, Tsukuba, Japan
[B-1-03]A Sidewall Electrode TiOx/TiOxNy ReRAM with Excellent Memory Window Control and Reliability Using Plasma Oxidation and a Novel Degradation-detecting Writing Algorithm
○D. Lee1, J. Wu1, M. Lee1, E. Lai1, W. Khwa1, Y. Lin1, W. Chen1, K. Chiang1, T. Wang1, S. Horng2, J. Gong2, H. Lung1, K. Hsieh1, C. Lu1(1.Macronix International Co., Ltd.(Taiwan), 2.National Tsing Hua Univ.(Taiwan))
