2017 International Conference on Solid State Devices and Materials
2017年9月19日〜9月22日Sendai International Center
[B-2-04]Influence of Surface Treatment of SiO2 Gate Insulator for Pentacene-based OFETs with Nitrogen-doped LaB6 Bottom-Contact Electrode Formation Process
○Y. Maeda1, M. Hiroki1, S. Ohmi1(1.Tokyo Tech (Japan))