Presentation Information
[P1-2pm-09]Flow-type LP-ALD process for the preparation of α-Fe2O3 thin films
○Mitsuki Takayanagi1, Yohei Yamane1, Naoki Osaka1, Kentarou Mori1 (1. College of Industrial Technology, Nihon University)
Keywords:
Thin film,Metal oxide,Deposition system