[P2-3vn] 18. Polymer

Japanese

[P2-3vn-06] Machine Learning-assisted Prediction of Chemical Resistance of Resin Materials for Semiconductor Manufacturing Equipment

○Shogo Kunieda¹, Mitsuru Yambe¹, Yosuke Hanawa¹, Hitoshi Kamijima², Toshiaki Shintani², Takuo Okude², Yoshihiro Hayashi³, Ryo Yoshida³ (1. SCREEN Holdings Co., Ltd., 2. Research Institute of Systems Planning, Inc., 3. The Institute of Statistical Mathematics)

Keywords:

Resin materials,Organic solvent,Chemical resistance,Machine learning