[SuB4] The potential & future of oxides

4:15 PM - 4:45 PM JST(7:15 AM - 7:45 AM UTC)

[SuB4-05] Low temperature growth of non-vacuum process of transparent conductive oxide film

〇Kenji Yoshino¹ (1. University of Miyazaki (Japan))

Transparent conductive oxide (TCO) films are essential in applications such as liquid crystal displays, touch panels, and solar cells. Among them, Sn-doped In₂O₃ (ITO) is the most widely used due to its excellent conductivity and transparency. However, indium is a rare and expensive metal, posing cost and supply issues. To address this, alternative materials such as F-doped SnO₂ (FTO) and Ga-doped ZnO (GZO) have attracted attention for their lower cost and comparable performance. Non-doped ZnO film was successfully grown on glass substrates by a conventional spin-coating method at room temperature using a DEZ-based solution under ambient air conditions. To the best of our knowledge, this is the first report of ZnO film growth achieved by a spin-coating process at RT. The resulting film exhibited an average optical transmittance exceeding 80% in the visible region. The surface morphology was flat and homogeneous. In addition, the high transmittance in the infrared region indicates a low free-carrier concentration in the film. The formation of the ZnO film at RT using the DEZ solution is attributed to the reaction between DEZ and atmospheric moisture.