[SuB4] The potential & future of oxides | CSW2026

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Session Details

WorkshopScope G: Oxide materials and devices

[SuB4]The potential & future of oxides

Sun. May 24, 2026 2:55 PM - 5:15 PM JST
Sun. May 24, 2026 5:55 AM - 8:15 AM UTC

Room B(3rd floor)

Chair:Toshiyuki Kawaharamura(Kochi Univ. of Technology)

2:55 PM - 3:00 PM JST(5:55 AM - 6:00 AM UTC)

[SuB4-01]Opening

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3:00 PM - 3:30 PM JST(6:00 AM - 6:30 AM UTC)

[SuB4-02]Resolving Hydrogen-associated Instability Issue for High-mobility Oxide (HMO) Thin-film Transistor

〇Mamoru Furuta¹, Yoshihiro Sato², Takafumi Kambe², Tsutomu Satoyoshi² (1. Kochi Univ. of Technol. (Japan), 2. Tokyo Electron Technology Solutions Ltd. (Japan))

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3:30 PM - 4:00 PM JST(6:30 AM - 7:00 AM UTC)

[SuB4-03]tentative

〇Nobuyoshi Saito¹ (1. KIOXIA Corporation (Japan))

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4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[SuB4-04]Break

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4:15 PM - 4:45 PM JST(7:15 AM - 7:45 AM UTC)

[SuB4-05]Low temperature growth of non-vacuum process of transparent conductive oxide film

〇Kenji Yoshino¹ (1. University of Miyazaki (Japan))

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4:45 PM - 5:15 PM JST(7:45 AM - 8:15 AM UTC)

[SuB4-06]Oxide Semiconductor Photonics: Opportunities and Challenges

〇Satoshi Iwamoto¹, Riena Jinno¹ (1. Univ. of Tokyo (Japan))

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