Presentation Information
[TuC4-04]Press-Pack β-Ga2O3 Schottky Barrier Diode for High-Power Operation
〇Wenpeng Zhou1, Kohei Sasaki2, Mian Tao3, Zhanqing Yu4, Shi-Wei Ricky Lee5, Akito Kuramata2, Rong Zeng4, Man Hoi Wong1 (1. Electronic and Computer Engineering, Hong Kong Univ. of Sci. and Tech. (Hong Kong), 2. Novel Crystal Technology Inc. (Japan), 3. EPACK Lab., Hong Kong Univ. of Sci. and Tech. (Hong Kong), 4. Electrical Engineering, Tsinghua Univ. (China), 5. Mechanical and Aerospace Engineering and EPACK Lab., Hong Kong Univ. of Sci. and Tech. (Hong Kong))
β-Ga2O3 is a competitive candidate for high-voltage power electronics because of its high critical field strength and easy access to high-quality native substrates. This work reports a press-pack β-Ga2O3 Schottky barrier diode (SBD) for high-power operation. Reverse current–voltage tests of the press-back β-Ga2O3 SBD under various pressures indicated that no mechanical damage or defects that could have degraded the electrical performance were generated. Forward current–voltage and thermal tests showed that a higher pressure would reduce the contact resistance and the thermal resistance (Rth), both of which are beneficial for increasing the power capacity of the press-pack β-Ga2O3 SBD. Under a pressure of 20 MPa, the steady-state junction temperature rise did not exceed 150 K at DC 10 A and a corresponding heating power of over 27 W, from which an Rth below 5 K/W was determined.
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