Presentation Information
[TuD1-05]Epitaxial Growth of 775 nm Strained In0.1Al0.2Ga0.7As Digital Alloy Quantum Well Laser Diodes for Quantum Photonic Applications
〇Tsimafei Laryn1,2, Yeonhwa Kim1,3, Kenneth Duque1,2, Won Jun Choi1, Daehwan Jung1,2 (1. Korea Inst. of Sci. and Tech. (Korea), 2. Univ. of Sci. and Tech. (Korea), 3. Korea Univ. (Korea))
We present the epitaxial growth and lasing performance of In0.1Al0.2Ga0.7As digital-alloy quantum well lasers emitting at 779 nm. We show that digital-alloy quantum wells exhibit superior optical properties compared to their random (mixed) alloy counterparts. Lasers based on digital-alloy quantum wells demonstrated amplified spontaneous regime operation at 779 nm, showcasing that with further laser-structure optimization, In0.1Al0.2Ga0.7As digital allow quantum wells can be efficiently used for 775 nm lasers.
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