[TuP3G] Oxide Materials & Devices

[TuP3G-14] Development of stable formation method of SrO thin film for STO thin film deposition by mist CVD method

〇Kun Liu¹, Ozaki Tamako¹, Li Liu¹, Htet Su Wai¹, Toshiyuki Kawaharamura¹ (1. kochi university of technology (Japan))

Strontiumbased oxide (SrO) thin films are important functional materials for dielectric layers and complex oxides such asSrTiO3, but their solutionbased fabrication is challenging due to high reactivity with moisture and carbon dioxide. In this study, SrOx thin films were deposited by fine-channel mist chemical vapor deposition (mist CVD). The solubility and film-forming behavior of SrCl₂6H₂O and Sr(acac)2 were investigated using water, methanol, and acetonitrile. While SrCl₂ failed to formcontinuous films up to 450C, aqueous Sr(acac)₂ enabled successful SrO_x film growth. Oxygenassisted deposition promoted continuous films with granular morphologies, as confirmed by XRD and SEM. These results identify key growth factors for SrOxthin films and support future SrTiO3 fabrication.