[TuP3G] Oxide Materials & Devices

2:00 PM - 4:00 PM JST(5:00 AM - 7:00 AM UTC)

[TuP3G-19 LN] Surfactant-assisted mist CVD growth of highly oriented (200) SnO₂ film on c-sapphire substrate

〇ABHAY KUMAR MONDAL¹, Htet Su Wai¹, Liu Kun¹, Sohaib Hassan¹, Toshiyuki Kawaharamura¹ (1. kochi university of Technology (Japan))

SrOx thin films were deposited by fine-channel mist chemical vapor deposition (mist CVD) to investigate the influence of growth atmosphere on film formation and crystallization behavior. Strontium 2,4-pentanedionate hydrate and strontium chloride hexahydrate were used as Sr precursors with various solvent systems, and oxygen or ammonia was introduced as a reaction promoter during deposition. Optical observations revealed that oxygen-assisted growth promotes the formation of continuous SrOx films with a uniform white appearance. X-ray diffraction analysis showed discernible diffraction features mainly in the 2θ range of 25–40°, indicating the formation of a moderately-crystallized Sr–O related phases under oxygen-assisted conditions. Furthermore, the presence of crystalline particles was confirmed when methanol was used as a solvent. These results suggest that both the state of the Sr source in solution and the reaction atmosphere during growth have a strong influence on the growth of SrOx thin films by mist CVD.