[WeB2] Thin Film Growth of Oxides

11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[WeB2-05] Influence of Mist CVD Reactor Design on the Structural and Morphological Properties of ZnO Thin Films

〇HTET SU WAI¹, Ryosuke Ohashi¹, Tatsuya Yasuoka, Toshiyuki Kawaharamura¹ (1. Kochi Univ. of Tech. (Japan))

ZnO thin films were deposited by mist chemical vapor deposition to investigate the effect of reactor configuration on film crystallinity and morphology. A fine-channel mist reactor and a combined hot-wall fine- channel mist reactor were compared under identical temperature and deposition conditions. ZnO films grown using the fine-channel reactor exhibited limited crystallinity and a narrow temperature range for strong c-axis orientation. In contrast, films deposited using the combined fine-channel hot-wall reactor showed enhanced (002) orientation, reduced diffraction peak broadening, and improved surface uniformity over a wider temperature range. The improved film quality in the combined hot-wall system is attributed to the characteristics of the carbon wall, which provides radiative heating that enhances energy transfer to the mist and promotes efficient precursor decomposition and crystal growth.