Presentation Information

[1C19]ドライ成膜電極における内部構造・局所電子抵抗・反応分布の複合評価

*Ayaka Yonaga1, Shigehiro Kawauchi1, Feilure Tuerxun1, Takuro Matsunaga1, Hiroshi Nakamura1, Gen Inoue2 (1. Toyota Central Research and Development Labs Inc (Japan), 2. Kyushu university (Japan))

Keywords:

ドライ成膜プロセス,電極構造,反応分布