Presentation Information
[P2-50]Numerical analysis on the distribution of stresses below the seeding interface in CZ-Si crystal growth
*Hiroki Tsukada1, Rintaro To1, Takeshi Hoshikawa1, Hiroyuki Saito2, Hisashi Matsumura1,2, Toshinori Taishi1 (1. Shinshu Univ. (Japan), 2. GlobalWafers Japan Co., Ltd. (Japan))