Presentation Information
[C-2A-10]Rectification characteristics of the 0.2 μm low-threshold GaAs E-pHEMT GAD
◎△Yusuke Sato1, Naoki Sakai1, Kenji Itoh1, Gaku Kato2, Naoki Nomura2 (1. Kanazawa Institute of Technology, 2. Nisshinbo Micro Devices Inc.)
Keywords:
GaAs,gated anode diode,Microwave
