General Conference of the Institute of Electronics, Information and Communication Engineers
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Presentation Information

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[C-6-01]Characterization of SiOx Films Deposited without Heating

〇Mayumi B. Takeyama1,2, Masaru Sato1 (1. Kitami Institute of Technology, 2. Science Tokyo, WOW aliance)

Keywords:

3D-LSI,Cu interconnect,low-temperature process,insulating film,SiO2 film

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