Presentation Information

[Th-P-14]Patterned Gold-Assisted Exfoliation of Monolayer MoS2 Utilizing an Ion Mill

〇Connor William Magee1, Louis Smet1, Daiki Sekine2,1, Hao Ding1, Sato Yamamoto1, Jun Ishihara1, Makoto Kohda1,2,3 (1. Tohoku Univ. (Japan), 2. QST (Japan), 3. CSIS (Japan))
Ion-milled patterned gold-assisted exfoliation was used to produce large, high-quality MoS2 monolayers on SiO2. This technique overcomes the limitations of conventional gold-assisted exfoliation, including surface contamination and measurement limitations, which reduce film size and quench photoluminescence, respectively.