[Tu-P] Material growth, structural properties, and characterization (bulk, nanowires, dots)

[Tu-P-14] In-Situ Helium Plasma Integrated ALD for Screening Effect Relaxation and Performance Enhancement in a-IGZO TFTs

〇Suhwan Hwang^1,2, Youn Sang Kim^1,3 (1. Seoul National Univ. (Korea), 2. Samsung Electronics Co., Ltd (Korea), 3. Advanced Inst. of Convergence Tech. (Korea))

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