Presentation Information
[Tu-P-21]Bayesian Analysis of Interfacial Crystal Distortions in Thermally Grown SiO2 and CVD-Deposited SiOX on a (001) Si Substrates via Crystal Truncation Rod Technique
Sekhar Halubai1, B. Liu1, Z. X. Ding1, K. Enomoto1, T. Kouno2, Y. Terasawa2, F. Imura3, T. Hashishin1, E. Magome4, I. Hirosawa4, M. Mizumaki2, 〇Ichiro Akai1 (1. Kumamoto Univ. (Japan), 2. NIDEK Co., Ltd (Japan), 3. Hundred Semiconductors Inc. (Japan), 4. SAGA-LS (Japan))
