Presentation Information
[Tu-P-28]Comparative Study of Laser Annealing and Rapid Thermal Annealing for Ohmic Contacts on Si-Doped β-Ga2O3
〇Md Modassir Anwer1, Prakhar Srivastava2, Amit Verma1 (1. Indian Institute of Technology Kanpur (India), 2. Indian Institute of Technology BHU (India))
