Presentation Information

[Tu-P-30]Electronic Transport in Amorphous Mictamict Ti-Si-O for Thin-Film Device Applications

Szymon Rzeczkowski1, Miłosz Bury2, Marek Wzorek2, Rafał Zybała2, Marta Gryglas-Borysiewicz1, 〇Michał Adam Borysiewicz2 (1. Faculty of Physics, University of Warsaw (Poland), 2. Łukasiewicz Research Network - Institute of Microelectronics and Photonics (Poland))
We investigate a new member of the M-Si-O mict-amict alloys: Ti-Si-O as cost-effective, stable wide bandgap oxide TCO films. Sputtered films transition from a degenerate metallic state obeying the Mooij rule to an insulating state, driven by the structural evolution of Ti-rich grains.