[We-P] Material growth, structural properties, and characterization (bulk, nanowires, dots)

[We-P-01] Low-Surface-Roughness p-Type NiO Thin Films Deposited by Ion Beam Sputtering for Glass Substrate Applications

〇Gui-Sheng Zeng¹, Bo-Huei Liao¹ (1. National Institutes of Applied Research (Taiwan))

NiO thin films, as key p-type materials, deposited by ion beam sputtering exhibit low surface roughness and excellent p-type properties, offering a promising process for oxide semiconductors.