[We-P] Material growth, structural properties, and characterization (bulk, nanowires, dots)

[We-P-11] Structural, Optical, and Electrical Properties of α-Fe₂O₃ Thin Films Formed by Oxidation of DC-Sputtered Fe Layers and Their Formation Process

〇Yuta Morimoto¹, Hiroshi Katsumata^1,2 (1. Graduate School of Sci. and Tech., Meiji Univ. (Japan), 2. School of Sci. and Tech., Meiji Univ. (Japan))

α-Fe₂O₃ thin films were fabricated by oxygen annealing of DC-sputtered Fe layers and compared with RF-sputtered films. The DC-process exhibited a sputtering rate more than twice as high. Higher DC power increased oxidation and grain growth, reducing band gap and resistivity due to lattice defects.