Presentation Information
[Mo-P-41]Thermal History Driven PEB Behavior on Si and 4H SiC Substrates in a KrF Lithography Process Using a Production Coater Developer Track
*Yuji Tanaka1, Naser Belmiloud1, Pierre Sixt2, Raphaël Feougier2, Béatrice Hemard2 (1. SCREEN SPE Germany GmbH (Germany), 2. Univ. Grenoble Alpes, CEA, Leti (France))