[Mo-P] Poster Session

[Mo-P-64] Impact of Nitrogen Profiles on Interface Passivation, Charge Trapping, and Breakdown Reliability in Thermal and Deposited Gate Oxides

*Runze Wang¹, Yu-Chieh Chien¹, Zijie Zheng^1,2, Xiaolin Wang^1,2, Leming Jiao^1,2, Liyuan Liu¹, Abdul Hannan Yeo¹, Qin Gui Voo¹, Weijie Wang¹, Umesh Chand¹, Xiao Gong^1,2, Navab Singh¹, Yee Chia Yeo^1,2 (1. Inst. of Microelectronics (IME), A*STAR (Singapore), 2. Electrical and Computer Engineering, National University of Singapore (NUS) (Singapore))