Presentation Information

[Th-P-13]MedeorTM Non-Uniform Ion Implantation for Device Performance and Yield Enhancement in SiC Power Devices

*Nan Zheng1, Supakit Charnvanichborikarn1, Tyler Wills1, Scott Oleson1, Hans Gossmann1, Xiangdong He1, Shan Tang1, William Bogiages1, Pratim Palit1, Jonathan Lowder1, Shardul Patel1, Wei Zou1, Jay Scheuer1 (1. Applied Materials, Inc. (USA))