Presentation Information
[Th-P-14]Technology Development of Implantation Masks for a Multi Epitaxy, Multi Implant Approach for 4H-SiC Superjunction Drift Zones
*Janina Engelhardt1, Oleg Rusch1, Volker Häublein1, Nikolas Schabert1, Rupert Ullmann2, Philip Hens2, Birgit Kallinger1, Michael Jank1 (1. Fraunhofer Inst. for Integrated Systems and Device Technology IISB (Germany), 2. Aixtron SE (Germany))
