Presentation Information
[Th-P-15]Monitoring Low-Dose Ion Implantation in 4H-SiC Wafers Using Photomodulated Reflectance Technique
*Laszlo Balogh1, Denes Ullrich1,2, Janos Szivos1, Zoltan Bozoki1, Gaszton Vizsnyiczai1, Bence Mate Kovacs1, Ors Sepsi1, Jeong Hyun Moon3 (1. Semilab Corp. (Hungary), 2. Budapest University of Technology and Economics (Hungary), 3. Korea Electrotechnology Research Inst. (Korea))