[Th-P] Poster Session

[Th-P-70] Evaluation of the Effective C/Si ratios during Thermal Etching and Growth on 4H-SiC(0001) Based on Macrostep Morphology

*Kohei Toda¹, Hibiki Tanaka², Riku Maeda², Koji Ashida¹, Daichi Dojima¹, Hiroshi Mihara¹, Tadaaki Kaneko^1,2 (1. QureDA Research, Inc. (Japan), 2. Kwansei Gakuin university (Japan))