[Tu-3A] Implantation and Trench Process Optimization

3:30 PM - 3:50 PM JST(6:30 AM - 6:50 AM UTC)

[Tu-3A-05] Comparative Study of Orthogonal P+ Implant Frequencies with Co-optimization of N+ and P-well Profiles in 1.2 kV 4H-SiC MOSFETs

*Dinuth Chamila Yapa Bandara Yapa Mudiyanselage¹, Skylar deBoer¹, Stephen A. Mancini¹, Justin Lynch², Seung Yup Jang², Adam J. Morgan², Woongje Sung¹ (1. State Univ. of New York, Univ. at Albany (USA), 2. NoMIS Power Corp. (USA))