Presentation Information
[Tu-P-44]Comparison of Nanosecond and Femtosecond UV Laser Annealing for Ohmic Contact Formation of Ni/4H-SiC
Yi-Chen Hung1, Ping-Yu Lin1, *Chiao-Yang Cheng1, Di-Hua Huang2, Yi-Chi Lee3 (1. Academy of Innovative Semiconductor and Sustainable Manufac., National Cheng Kung Univ., Tainan 701 (Taiwan), 2. JUMBO LASER Co., Ltd., Tainan 744 (Taiwan), 3. Indus. Tech. and Res. Inst., Hsinchu 310 (Taiwan))