[We-P] Poster Session

[We-P-21] Comparative Study of Gate Oxide Screening With Adjustment Pulse Technique using Commercial and In-House 4H-SiC MOSFETs

*Monikuntala Bhattacharya¹, Michael Jin², Marvin H White², Atsushi Shimbori³, Anant K Agarwal² (1. L&T Semiconductor Technologies (India), 2. The Ohio State University (USA), 3. Ford Motor Company (USA))