Presentation Information
[We-P-39]CD-SEM Enabled Measurement of Etched Trench Sidewall Roughness
*Paul Smith1, Daniel Fischer1, Shimon Levi2, Oleg Rusch3, Alesa Fuchs3 (1. Applied Materials GmbH (Germany), 2. Applied Materials Ltd. (Israel), 3. Fraunhofer IISB (Germany))
